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    • Lipid Membrane Nanostructure
    • Amyloid Fibrils
    • Single Cell Mechanobiology
    • Biocompatible Materials
    • Lubricating Polymer Brushes
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    • Ultra Low Noise AFM
    • Digital FM-AFM
    • Amyloid Adhesives
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Journal Article: Nitrogen reactive ion etch processes for the selective removal of poly-(4-vinylpyridine) in block copolymer films

December 21, 2018 Brian Rodriguez

Paper in Nanotechnology led by Dr. Susan Kelleher’s group in the UCD School of Chemistry on selective etching in block copolymer films by nitrogen reactive ion etching.

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← Journal Article: Electromechanical-mnemonic effects in BiFeO3 for electric field history-dependent crystallographic phase patterningArxiv: Giant negative electrostriction and dielectric tunability in a van der Waals layered ferroelectric →

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